Plasma potential influence on ion energy Distribution function in ICP source
In this work, the deviation of energy distribution function of energetic ions from the predetermined value in an inductively coupled plasma (ICP) ion gun source is discussed. An abnormal plasma potential increase at an extraction voltage 400 V caused a beam energy shift of up to 50 eV compared to...
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| Published in: | Физическая инженерия поверхности |
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| Date: | 2007 |
| Main Authors: | , , |
| Format: | Article |
| Language: | English |
| Published: |
Науковий фізико-технологічний центр МОН та НАН України
2007
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| Online Access: | https://nasplib.isofts.kiev.ua/handle/123456789/98816 |
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| Journal Title: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| Cite this: | Plasma potential influence on ion energy Distribution function in ICP source / O.V. Vozniy, G.Y. Yeom, A.Yu. Kropotov // Физическая инженерия поверхности. — 2007. — Т. 5, № 1-2. — С. 28–33. — Бібліогр.: 21 назв. — англ. |