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Plasma potential influence on ion energy Distribution function in ICP source

In this work, the deviation of energy distribution function of energetic ions from the predetermined
 value in an inductively coupled plasma (ICP) ion gun source is discussed. An abnormal plasma potential
 increase at an extraction voltage 400 V caused a beam energy shift of up to 50...

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Bibliographic Details
Published in:Физическая инженерия поверхности
Date:2007
Main Authors: Vozniy, O.V., Yeom, G.Y., Kropotov, A.Yu.
Format: Article
Language:English
Published: Науковий фізико-технологічний центр МОН та НАН України 2007
Online Access:https://nasplib.isofts.kiev.ua/handle/123456789/98816
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Journal Title:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Cite this:Plasma potential influence on ion energy Distribution function in ICP source / O.V. Vozniy, G.Y. Yeom, A.Yu. Kropotov // Физическая инженерия поверхности. — 2007. — Т. 5, № 1-2. — С. 28–33. — Бібліогр.: 21 назв. — англ.

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Digital Library of Periodicals of National Academy of Sciences of Ukraine

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