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Comparison of physicochemical properties of nitride films produced by various reactive sputtering methods

Improvement of physical, mechanical and chemical properties of thin nitride films depends on the methods of their deposition and improvement of the structure, which determines the obtained properties. In the production of nitride films, which are promising in solid-state microelectronics and instrum...

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Bibliographic Details
Date:	2014
Main Authors:	Василенко, Наталья Афанасьевна, Василенко, Алексей Олегович
Format:	Article
Language:	Russian
Published:	Інститут енергетичних машин і систем ім. А. М. Підгорного Національної академії наук України 2014
Subjects:	ion implantation condensation and ion bombardment nitride physicochemical properties УДК 535.338.43.533.59
Online Access:	https://journals.uran.ua/jme/article/view/19925
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Journal Title:	Energy Technologies & Resource Saving

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Energy Technologies & Resource Saving

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