Comparison of physicochemical properties of nitride films produced by various reactive sputtering methods

• Datum: 2014
• Hauptverfasser: Василенко, Наталья Афанасьевна, Василенко, Алексей Олегович
• Format: Artikel
• Sprache: Russisch
• Veröffentlicht: Інститут енергетичних машин і систем ім. А. М. Підгорного Національної академії наук України 2014
• Schlagworte: ion implantation; condensation and ion bombardment; nitride; physicochemical properties; УДК 535.338.43.533.59
• Online Zugang: https://journals.uran.ua/jme/article/view/19925
• Назва журналу: Energy Technologies & Resource Saving

Improvement of physical, mechanical and chemical properties of thin nitride films depends on the methods of their deposition and improvement of the structure, which determines the obtained properties. In the production of nitride films, which are promising in solid-state microelectronics and instrum...