Проблеми хіміко-динамічного полірування в технології кремнієвих p-i-n фотодіодів
During the preparation of silicon substrates for the manufacture of silicon p-i-n photodiodes, the effect of the presence of chemical-dynamic polishing and the depth of etching on the electrical parameters of the FD was observed. The quality of the polishing operation also affected the optical and p...
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| Date: | 2023 |
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| Main Author: | |
| Format: | Article |
| Language: | Ukrainian |
| Published: |
Chuiko Institute of Surface Chemistry National Academy of Sciences of Ukraine
2023
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| Subjects: | |
| Online Access: | https://www.cpts.com.ua/index.php/cpts/article/view/658 |
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| Journal Title: | Chemistry, Physics and Technology of Surface |