Кинетика десорбционной очистки поверхности кремниевых пластин в перекисно-аммиачных растворах
The paper investigates desorption of cations (Na⁺, Fe³⁺, Cu²⁺, Ag⁺) and atoms (Au), as well as anions S²⁻ and Cl⁻ from the surface of silicon wafers KDB-10 with orientations (100) and (110) during treatment at 70 °C in peroxide–ammonia solutions of three compositions. The method of radioactive isoto...
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| Datum: | 2003 |
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| Hauptverfasser: | , , |
| Format: | Artikel |
| Sprache: | Ukrainisch |
| Veröffentlicht: |
PE "Politekhperiodika", Book and Journal Publishers
2003
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| Schlagworte: | |
| Online Zugang: | https://www.tkea.com.ua/index.php/journal/article/view/TKEA2003.6.59 |
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| Назва журналу: | Technology and design in electronic equipment |