Кинетика десорбционной очистки поверхности кремниевых пластин в перекисно-аммиачных растворах

The paper investigates desorption of cations (Na⁺, Fe³⁺, Cu²⁺, Ag⁺) and atoms (Au), as well as anions S²⁻ and Cl⁻ from the surface of silicon wafers KDB-10 with orientations (100) and (110) during treatment at 70 °C in peroxide–ammonia solutions of three compositions. The method of radioactive isoto...

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Bibliographic Details
Date:2003
Main Authors: Poltavtsev, Yu. G., Virchenko, P. T., Kostyuk, V. V.
Format: Article
Language:Ukrainian
Published: PE "Politekhperiodika", Book and Journal Publishers 2003
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Online Access:https://www.tkea.com.ua/index.php/journal/article/view/TKEA2003.6.59
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Journal Title:Technology and design in electronic equipment

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Technology and design in electronic equipment