Влияние параметров ВЧ-разряда и параметров нагревателя на температуру подложки в плазмохимическом реакторе «Алмаз» для синтеза углеродных алмазоподобных пленок

• Дата: 2014
• Автори: Hladkovskiy, V. V., Kostin, E. G., Polozov, B. P., Fedorovich, O. A., Petriakov, V. A.
• Формат: Стаття
• Мова: Ukrainian
• Опубліковано: PE "Politekhperiodika", Book and Journal Publishers 2014
• Теми: углеродные алмазоподобные пленки; плазмохимический реактор; подложка; температура нагрева
• Онлайн доступ: https://www.tkea.com.ua/index.php/journal/article/view/TKEA2014.5-6.39
• Назва журналу: Technology and design in electronic equipment

The paper presents the research results on the device for obtaining diamond-like films from gas phase, constructed and tested in the Institute for Nuclear Research of the National Academy of Sciences. The device is based on a high-frequency (HF) discharge (13,56 MHz) into controlled crossed magnetic and electric fields. The discharge is excited in H2+CH4 or H2+CH4+Ar mixtures in different proportions. Working pressure in the chamber is 10–1 – 10–2 Torr. From the obtained results, the authors determine the time period for establishing of equilibrium substrate temperature at different HF discharge and main heater parameters. HF discharges, in the conditions of this study, at substrate temperatures above 600°C have virtually no influence on the temperature rise of the substrate. In addition, a new heater is proposed in order to increase the attainable temperature and reduce the time for establishing the equilibrium substrate temperature. A fehral heater can not heat the substrate to temperatures above 650°C. A molybdenum wire as a material of the heater can ensure the substrate holder temperature above 1000°C in a hydrogen atmosphere, but it has a short lifespan of a few months at the maximum temperature under daily use.