Свойства двойных гетеропереходов p+-InP/n-InGaAsP/n-InP, изготовленных методом жид­ко­фаз­ной эпитаксии

Свойства двойных гетеропереходов p+-InP/n-InGaAsP/n-InP, изготовленных методом жид­ко­фаз­ной эпитаксии

The double epitaxial p+-InP/n-InGaAsP/n-InP heterostructures with coinciding electrical and metallurgical boundaries has been obtained. Such coincidence is achieved due to growing an additional buffer n-InP layer and de...

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Bibliographic Details
Date:2012
Main Authors: Vakiv, N. M., Krukovskii, S. I., Sukach, A. V., Tetyorkin, V. V., Mrykhin, I. A., Mikhashchuk, Yu. S., Kru­kov­skii, R. S.
Format: Article
Language:Ukrainian
Published: PE "Politekhperiodika", Book and Journal Publishers 2012
Subjects:
эпитаксиальные гетероструктуры
жидкофазная эпитаксия
легирование
электролюминесценция
фоточувствительность
Online Access:https://www.tkea.com.ua/index.php/journal/article/view/TKEA2012.2.27
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Journal Title:Technology and design in electronic equipment

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Technology and design in electronic equipment
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Summary:The double epitaxial p+-InP/n-InGaAsP/n-InP heterostructures with coinciding electrical and metallurgical boundaries has been obtained. Such coincidence is achieved due to growing an additional buffer n-InP layer and decreasing the time for growing an emitter p+-InP layer heavily doped by zinc. Electroluminescence spectra of such structures have a smaller half-width and the infrared radiation of higher power than the structures in which the p–n-junction is formed in the InGaAsP layer. These heterostructures are designed to create efficient IR LEDs with wavelength of 1,06 mm in spectrum maximum.

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