Исследование допустимой импульсной мощности кремниевой p+–p–n+-структуры
The conducted researches of the thermal parameters of the silicon p+–p–n+-structure under the influence of the pulse signal have shown that the structure thermal resistance decreases in proportion to the decrease in the thickness of the base region and the dependence of the superheating tem...
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| Datum: | 2011 |
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| Hauptverfasser: | , , , , |
| Format: | Artikel |
| Sprache: | Ukrainian |
| Veröffentlicht: |
PE "Politekhperiodika", Book and Journal Publishers
2011
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| Schlagworte: | |
| Online Zugang: | https://www.tkea.com.ua/index.php/journal/article/view/TKEA2011.6.43 |
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| Назва журналу: | Technology and design in electronic equipment |