Повышение надежности контакта тонкопленочных резисторов

• Date: 2010
• Main Authors: Lugin, A. N., Ozemsha, M. M.
• Format: Article
• Language: Ukrainian
• Published: PE "Politekhperiodika", Book and Journal Publishers 2010
• Subjects: контакт; тонкопленочный резистор; плотность тока; мощность рассеяния
• Online Access: https://www.tkea.com.ua/index.php/journal/article/view/TKEA2010.5-6.11
• Journal Title: Technology and design in electronic equipment

Necessity of resistive layer growth under the contact and in the contact zone of resistive element is shown in order to reduce peak values of current flow and power dissipation in the contact of thin film resistor, thereby to increase the resistor stability to parametric and catastrophic failures.