Широкоапертурный высокочастотный источник ионов низкой энергии с электронной компенсацией
Characteristics of single-grid RF ion source with 250 mm beam diameter and 1A beam current have been studied. Energy distribution functions of electrons and ions emitted by the source have been measured. It is shown that the emitted electron current is sufficient for full ion beam current compensati...
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| Datum: | 2010 |
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| Hauptverfasser: | , , |
| Format: | Artikel |
| Sprache: | Ukrainian |
| Veröffentlicht: |
PE "Politekhperiodika", Book and Journal Publishers
2010
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| Schlagworte: | |
| Online Zugang: | https://www.tkea.com.ua/index.php/journal/article/view/TKEA2010.2.52 |
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| Назва журналу: | Technology and design in electronic equipment |
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Technology and design in electronic equipment| Zusammenfassung: | Characteristics of single-grid RF ion source with 250 mm beam diameter and 1A beam current have been studied. Energy distribution functions of electrons and ions emitted by the source have been measured. It is shown that the emitted electron current is sufficient for full ion beam current compensation. The technique of ion to electron current ratio control allowing to change this ratio in wide range is proposed. Using the ICP in the source allows reaching high current density in the low ion energy range, with the possibility of independent control of ion energy and current density. |
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