Особенности плазмохимического травления торцов крем­ние­вых плас­тин для фо­то­элек­три­чес­ких пре­об­ра­зо­ва­те­лей

Особенности плазмохимического травления торцов крем­ние­вых плас­тин для фо­то­элек­три­чес­ких пре­об­ра­зо­ва­те­лей

Results of technological researches of plasmachemical reactor (PCR) for etching of silicon plate edges of photo-electric converters are described. Dependences of silicon etching speed on a discharge current, magnetic field intensity, quantity of the process able surface area and gases composition ar...

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Bibliographische Detailangaben
Datum:2009
Hauptverfasser: Fedorovich, O. A., Kruglenko, M. P., Polozov, B. P.
Format: Artikel
Sprache:Ukrainian
Veröffentlicht: PE "Politekhperiodika", Book and Journal Publishers 2009
Schlagworte:
плазмохимический реактор
плазмохимическое травление
монокремний
скорость травления
ток разряда
фотоэлектрические преобразователи
Online Zugang:https://www.tkea.com.ua/index.php/journal/article/view/TKEA2009.6.46
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Назва журналу:Technology and design in electronic equipment

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Technology and design in electronic equipment
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Zusammenfassung:Results of technological researches of plasmachemical reactor (PCR) for etching of silicon plate edges of photo-electric converters are described. Dependences of silicon etching speed on a discharge current, magnetic field intensity, quantity of the process able surface area and gases composition are resulted. Recommendations on technological use of PCR in an industrial production of photo-electric converters (PEC) are given. The productivity of PCR, developed in INR, is higher than productivity of the best foreign analogue of firm «Alkatel» more than in two times.

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