Особенности плазмохимического травления торцов кремниевых пластин для фотоэлектрических преобразователей
Results of technological researches of plasmachemical reactor (PCR) for etching of silicon plate edges of photo-electric converters are described. Dependences of silicon etching speed on a discharge current, magnetic field intensity, quantity of the process able surface area and gases composition ar...
Збережено в:
| Дата: | 2009 |
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| Автори: | , , |
| Формат: | Стаття |
| Мова: | Ukrainian |
| Опубліковано: |
PE "Politekhperiodika", Book and Journal Publishers
2009
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| Теми: | |
| Онлайн доступ: | https://www.tkea.com.ua/index.php/journal/article/view/TKEA2009.6.46 |
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| Назва журналу: | Technology and design in electronic equipment |
Репозитарії
Technology and design in electronic equipment| Резюме: | Results of technological researches of plasmachemical reactor (PCR) for etching of silicon plate edges of photo-electric converters are described. Dependences of silicon etching speed on a discharge current, magnetic field intensity, quantity of the process able surface area and gases composition are resulted. Recommendations on technological use of PCR in an industrial production of photo-electric converters (PEC) are given. The productivity of PCR, developed in INR, is higher than productivity of the best foreign analogue of firm «Alkatel» more than in two times. |
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