Исследование погрешности сопротивления тонкопленочного резистора
A relationship between a thin-film resistor resistance error and mask misalignment with a substrate conductive layer at the second photolithography stage for a thin-film resistor design in which the resistive element does not overlap conductor pads is studied. The error value is at a maximum when th...
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| Date: | 2009 |
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| Main Author: | |
| Format: | Article |
| Language: | Ukrainian |
| Published: |
PE "Politekhperiodika", Book and Journal Publishers
2009
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| Subjects: | |
| Online Access: | https://www.tkea.com.ua/index.php/journal/article/view/TKEA2009.5.42 |
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| Journal Title: | Technology and design in electronic equipment |