Приборно-технологическое моделирование автоэмиссионных кремниевых микрокатодов
A structure of a system for converting topological information for digital lithography is proposed. A method for forming local three-dimensional SOI (Silicon-on-Insulator) structures has been developed, which makes it possible to create both planar and three-dimensional device elements and contacts....
Saved in:
| Date: | 2008 |
|---|---|
| Main Authors: | , , , , |
| Format: | Article |
| Language: | Ukrainian |
| Published: |
PE "Politekhperiodika", Book and Journal Publishers
2008
|
| Subjects: | |
| Online Access: | https://www.tkea.com.ua/index.php/journal/article/view/TKEA2008.5.43 |
| Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
| Journal Title: | Technology and design in electronic equipment |
Institution
Technology and design in electronic equipmentBe the first to leave a comment!