Приборно-технологическое моделирование автоэмиссионных кремниевых микрокатодов

A structure of a system for converting topological information for digital lithography is proposed. A method for forming local three-dimensional SOI (Silicon-on-Insulator) structures has been developed, which makes it possible to create both planar and three-dimensional device elements and contacts....

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Bibliographische Detailangaben
Datum:2008
Hauptverfasser: Druzhynin, А. A., Holota, V. I., Kogut, I. T., Sapon, S. V., Khoverko, Yu. M.
Format: Artikel
Sprache:Ukrainisch
Veröffentlicht: PE "Politekhperiodika", Book and Journal Publishers 2008
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Online Zugang:https://www.tkea.com.ua/index.php/journal/article/view/TKEA2008.5.43
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Назва журналу:Technology and design in electronic equipment

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Technology and design in electronic equipment