Технология изготовления автоэмиссионных кремниевых катодов субмикронных размеров
Modern fabrication technologies of field emission cathodes are analyzed. A practical method for forming topological elements of submicron dimensions is proposed. A CMOS-based technology using micron-scale photomasks has been developed and modeled for the fabrication of single-tip, multi-tip, and bl...
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| Datum: | 2007 |
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| Hauptverfasser: | , , |
| Format: | Artikel |
| Sprache: | Ukrainisch |
| Veröffentlicht: |
PE "Politekhperiodika", Book and Journal Publishers
2007
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| Schlagworte: | |
| Online Zugang: | https://www.tkea.com.ua/index.php/journal/article/view/TKEA2007.5.50 |
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| Назва журналу: | Technology and design in electronic equipment |