Коррекция оптических эффектов близости при проектировании микросхем

Methods and types of figures for optical proximity correction are considered. The lithography process was simulated using the discussed correction figures, and the modeling results were experimentally verified

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Bibliographische Detailangaben
Datum:2007
Hauptverfasser: Rodionov, I. A., Makarchuk, V. V.
Format: Artikel
Sprache:Ukrainisch
Veröffentlicht: PE "Politekhperiodika", Book and Journal Publishers 2007
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Online Zugang:https://www.tkea.com.ua/index.php/journal/article/view/TKEA2007.3.30
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Назва журналу:Technology and design in electronic equipment

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Technology and design in electronic equipment

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