Коррекция оптических эффектов близости при проектировании микросхем

• Date: 2007
• Main Authors: Rodionov, I. A., Makarchuk, V. V.
• Format: Article
• Language: Ukrainian
• Published: PE "Politekhperiodika", Book and Journal Publishers 2007
• Subjects: литография; коррекция; эффект близости; моделирование
• Online Access: https://www.tkea.com.ua/index.php/journal/article/view/TKEA2007.3.30
• Journal Title: Technology and design in electronic equipment

Methods and types of figures for optical proximity correction are considered. The lithography process was simulated using the discussed correction figures, and the modeling results were experimentally verified