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Наноструктурированные пленки ZnO для устройств микроэлектроники и оптики

ZnO films were obtained by RF magnetron sputtering. An additional magnetic field was applied using a magnetic system placed behind the substrate holder. The influence of process parameters on the structure and functional properties of the films was established. ZnO films were employed in the develop...

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Bibliographic Details
Date:2006
Main Authors: Belyanin, A. F., Krivchenko, V. A., Lopaev, D. V., Pavlushkin, L. V., Paschenko, P. V., Pirogov, V. G., Polyakov, S. N., Suetin, N. V., Sushentsov, N. I.
Format: Article
Language:Ukrainian
Published: PE "Politekhperiodika", Book and Journal Publishers 2006
Subjects:
пленки ZnO
магнетронное распыление
электроника
оптика
Online Access:https://www.tkea.com.ua/index.php/journal/article/view/TKEA2006.6.48
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Journal Title:Technology and design in electronic equipment

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Technology and design in electronic equipment
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Summary:ZnO films were obtained by RF magnetron sputtering. An additional magnetic field was applied using a magnetic system placed behind the substrate holder. The influence of process parameters on the structure and functional properties of the films was established. ZnO films were employed in the development of surface acoustic wave filters and ultraviolet mirrors

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