Система фотометрического контроля скорости травления тонких диэлектрических пленок

A methodology for photometric control of the etching rate of thin dielectric films is proposed, the essence of which consists in applying methods of double differentiation and time intervals to the signal of a photometric measuring device. An automated photometric system implementing this methodolo...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Datum:2006
Hauptverfasser: Semyonova, S. E., Semyonov, E. I.
Format: Artikel
Sprache:Ukrainisch
Veröffentlicht: PE "Politekhperiodika", Book and Journal Publishers 2006
Schlagworte:
Online Zugang:https://www.tkea.com.ua/index.php/journal/article/view/TKEA2006.1.43
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Назва журналу:Technology and design in electronic equipment

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Technology and design in electronic equipment