Система фотометрического контроля скорости травления тонких диэлектрических пленок
A methodology for photometric control of the etching rate of thin dielectric films is proposed, the essence of which consists in applying methods of double differentiation and time intervals to the signal of a photometric measuring device. An automated photometric system implementing this methodolo...
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| Date: | 2006 |
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| Main Authors: | , |
| Format: | Article |
| Language: | Ukrainian |
| Published: |
PE "Politekhperiodika", Book and Journal Publishers
2006
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| Subjects: | |
| Online Access: | https://www.tkea.com.ua/index.php/journal/article/view/TKEA2006.1.43 |
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| Journal Title: | Technology and design in electronic equipment |
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Technology and design in electronic equipment| Summary: | A methodology for photometric control of the etching rate of thin dielectric films is proposed, the essence of which consists in applying methods of double differentiation and time intervals to the signal of a photometric measuring device. An automated photometric system implementing this methodology is described. A program has been developed for processing the obtained signal and calculating the current etching rate. Graphs of the photometric signal, film thickness, and instantaneous deposition or etching rate of the dielectric film are displayed on the computer screen.
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