Система фотометрического контроля скорости травления тонких диэлектрических пленок

A methodology for photometric control of the etching rate of thin dielectric films is proposed, the essence of which consists in applying methods of double differentiation and time intervals to the signal of a photometric measuring device. An automated photometric system implementing this methodolo...

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Bibliographic Details
Date:2006
Main Authors: Semyonova, S. E., Semyonov, E. I.
Format: Article
Language:Ukrainian
Published: PE "Politekhperiodika", Book and Journal Publishers 2006
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Online Access:https://www.tkea.com.ua/index.php/journal/article/view/TKEA2006.1.43
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Journal Title:Technology and design in electronic equipment

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Technology and design in electronic equipment