Bilanych, B. V., Shylenko, O., Latyshev, V. M., Feher, A., Bilanych, V. S., Rizak, V. M., & Komanicky, V. (2020). Interaction of chalcogenide As4Se96 films with electron beam when used as electronic resists.
Chicago-Zitierstil (17. Ausg.)Bilanych, B. V., O. Shylenko, V. M. Latyshev, A. Feher, V. S. Bilanych, V. M. Rizak, und V. Komanicky. Interaction of Chalcogenide As4Se96 Films with Electron Beam When Used as Electronic Resists. 2020.
MLA-Zitierstil (8. Ausg.)Bilanych, B. V., et al. Interaction of Chalcogenide As4Se96 Films with Electron Beam When Used as Electronic Resists. 2020.
Achtung: Diese Zitate sind unter Umständen nicht zu 100% korrekt.