APA (7th ed.) Citation

Bilanych, B. V., Shylenko, O., Latyshev, V. M., Feher, A., Bilanych, V. S., Rizak, V. M., & Komanicky, V. (2020). Interaction of chalcogenide As4Se96 films with electron beam when used as electronic resists.

Chicago Style (17th ed.) Citation

Bilanych, B. V., O. Shylenko, V. M. Latyshev, A. Feher, V. S. Bilanych, V. M. Rizak, and V. Komanicky. Interaction of Chalcogenide As4Se96 Films with Electron Beam When Used as Electronic Resists. 2020.

MLA (8th ed.) Citation

Bilanych, B. V., et al. Interaction of Chalcogenide As4Se96 Films with Electron Beam When Used as Electronic Resists. 2020.

Warning: These citations may not always be 100% accurate.