The influence of substrate temperature on properties of Cu-Al-O films deposited using the reactive ion beam sputtering method

Збережено в:
Бібліографічні деталі
Дата:2017
Автори: A. I. Ievtushenko, M. G. Dusheyko, V. A. Karpyna, O. I. Bykov, P. M. Lytvyn, O. I. Olifan, V. A. Levchenko, A. A. Korchovyi, S. P. Starik, S. V. Tkach, E. F. Kuzmenko, G. V. Lashkarev
Формат: Стаття
Мова:Англійська
Опубліковано: 2017
Назва видання:Semiconductor Physics, Quantum Electronics and Optoelectronics
Онлайн доступ:http://jnas.nbuv.gov.ua/article/UJRN-0000778507
Теги: Додати тег
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Назва журналу:Library portal of National Academy of Sciences of Ukraine | LibNAS

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Library portal of National Academy of Sciences of Ukraine | LibNAS
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author A. I. Ievtushenko
M. G. Dusheyko
V. A. Karpyna
O. I. Bykov
P. M. Lytvyn
O. I. Olifan
V. A. Levchenko
A. A. Korchovyi
S. P. Starik
S. V. Tkach
E. F. Kuzmenko
G. V. Lashkarev
author_facet A. I. Ievtushenko
M. G. Dusheyko
V. A. Karpyna
O. I. Bykov
P. M. Lytvyn
O. I. Olifan
V. A. Levchenko
A. A. Korchovyi
S. P. Starik
S. V. Tkach
E. F. Kuzmenko
G. V. Lashkarev
author_sort A. I. Ievtushenko
collection Open-Science
first_indexed 2025-07-17T18:57:35Z
format Article
id open-sciencenbuvgovua-38396
institution Library portal of National Academy of Sciences of Ukraine | LibNAS
language English
last_indexed 2025-07-17T18:57:35Z
publishDate 2017
record_format dspace
series Semiconductor Physics, Quantum Electronics and Optoelectronics
spelling open-sciencenbuvgovua-383962024-02-29T11:41:15Z The influence of substrate temperature on properties of Cu-Al-O films deposited using the reactive ion beam sputtering method A. I. Ievtushenko M. G. Dusheyko V. A. Karpyna O. I. Bykov P. M. Lytvyn O. I. Olifan V. A. Levchenko A. A. Korchovyi S. P. Starik S. V. Tkach E. F. Kuzmenko G. V. Lashkarev 1560-8034 2017 en Semiconductor Physics, Quantum Electronics and Optoelectronics http://jnas.nbuv.gov.ua/article/UJRN-0000778507 Article
spellingShingle Semiconductor Physics, Quantum Electronics and Optoelectronics
A. I. Ievtushenko
M. G. Dusheyko
V. A. Karpyna
O. I. Bykov
P. M. Lytvyn
O. I. Olifan
V. A. Levchenko
A. A. Korchovyi
S. P. Starik
S. V. Tkach
E. F. Kuzmenko
G. V. Lashkarev
The influence of substrate temperature on properties of Cu-Al-O films deposited using the reactive ion beam sputtering method
title The influence of substrate temperature on properties of Cu-Al-O films deposited using the reactive ion beam sputtering method
title_full The influence of substrate temperature on properties of Cu-Al-O films deposited using the reactive ion beam sputtering method
title_fullStr The influence of substrate temperature on properties of Cu-Al-O films deposited using the reactive ion beam sputtering method
title_full_unstemmed The influence of substrate temperature on properties of Cu-Al-O films deposited using the reactive ion beam sputtering method
title_short The influence of substrate temperature on properties of Cu-Al-O films deposited using the reactive ion beam sputtering method
title_sort influence of substrate temperature on properties of cu-al-o films deposited using the reactive ion beam sputtering method
url http://jnas.nbuv.gov.ua/article/UJRN-0000778507
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