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2025-02-23T07:11:22-05:00 DEBUG: VuFindSearch\Backend\Solr\Connector: => GET http://localhost:8983/solr/biblio/select?fl=%2A&wt=json&json.nl=arrarr&q=id%3A%22open-sciencenbuvgovua-38396%22&qt=morelikethis&rows=5
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The influence of substrate temperature on properties of Cu-Al-O films deposited using the reactive ion beam sputtering method

The influence of substrate temperature on properties of Cu-Al-O films deposited using the reactive ion beam sputtering method

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Bibliographic Details
Main Authors: A. I. Ievtushenko, M. G. Dusheyko, V. A. Karpyna, O. I. Bykov, P. M. Lytvyn, O. I. Olifan, V. A. Levchenko, A. A. Korchovyi, S. P. Starik, S. V. Tkach, E. F. Kuzmenko, G. V. Lashkarev
Format: Article
Language:English
Published: 2017
Series:Semiconductor Physics, Quantum Electronics and Optoelectronics
Online Access:http://jnas.nbuv.gov.ua/article/UJRN-0000778507
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