Investigation of the influence of oxygen on the rate and anisotropy of deep etching of silicon in the plasma-chemical reactor with the controlled magnetic field

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Bibliographic Details
Date:2017
Main Authors: V. V. Gladkovskij, O. A. Fedorovich
Format: Article
Language:English
Published: 2017
Series:Technology and design in electronic equipment
Online Access:http://jnas.nbuv.gov.ua/article/UJRN-0000798647
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Journal Title:Library portal of National Academy of Sciences of Ukraine | LibNAS

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Library portal of National Academy of Sciences of Ukraine | LibNAS

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