Cover Image

Investigation of the influence of oxygen on the rate and anisotropy of deep etching of silicon in the plasma-chemical reactor with the controlled magnetic field

Saved in:

Bibliographic Details
Date:	2017
Main Authors:	V. V. Gladkovskij, O. A. Fedorovich
Format:	Article
Language:	English
Published:	2017
Series:	Technology and design in electronic equipment
Online Access:	http://jnas.nbuv.gov.ua/article/UJRN-0000798647
Tags:	Add Tag No Tags, Be the first to tag this record!
Journal Title:	Library portal of National Academy of Sciences of Ukraine \| LibNAS

Institution

Library portal of National Academy of Sciences of Ukraine | LibNAS

Similar Items

Experimental research of ICP reactor for plasma-chemical etching
by: Dudin, S.V., et al.
Published: (2006)

The bias voltage and its influence on the etching rate of silicon
by: Fedorovich, О.А., et al.
Published: (2015)

Influence of the plasma chemical etching on the silicon plates surface of photo electric converters
by: B. P. Polozov, et al.
Published: (2006)

Development of deep silicon plasma etching for 3D integration technology
by: A. A. Golishnikov, et al.
Published: (2014)

Spectroscopic studies of RF discharge plasma at plasma-chemical etching of gallium nitride epitaxial structures
by: V. V. Hladkovskiy, et al.
Published: (2017)

Spectroscopic studies of RF discharge plasma at plasma-chemical etching of gallium nitride epitaxial structures
by: V. V. Hladkovskiy, et al.
Published: (2017)

About peculiarities of self-bias voltage formation in plasma-chemical reactors with controlled magnetic fields
by: Hladkovskiy, V.V., et al.
Published: (2015)

Automation of measurements of the rate of thin films chemical etching
by: Іваницький, В. П., et al.
Published: (2024)

Features of plasma chemical etching of lithium tantalate substrate (LiTaO₃)
by: Fedorovich, O.A., et al.
Published: (2021)

Automated system for real-time control of plasma-chemical etching process in ICP
by: S. V. Dudin
Published: (2006)

The influence of HF discharge parameters and heater settings on the substrate temperature in the plasma-chemical reactor &quot;Almaz&quot; for the synthesis of diamond-like carbon films
by: V. V. Gladkovskij, et al.
Published: (2014)

Obtaining porous silicon suitable for sensor technology using MacEtch nonelectrolytic etching
by: I. R. Jatsunskij
Published: (2013)

About influence of energy of electrons and ions on speed of electron- and ion-stimulated plasmachemical etching of silicon
by: Fedorovich, O.A., et al.
Published: (2010)

Investigation of the process of microrelief structures formation in chromium films based on the method of chemical etching
by: A. V. Pankratova, et al.
Published: (2021)

Investigation of the process of microrelief structures formation in chromium films based on the method of chemical etching
by: Панкратова, А. В., et al.
Published: (2021)

Photometric monitoring of etching rate of thin dielectric films
by: S. E. Semenova, et al.
Published: (2006)

Preferential etching by flowing oxygen on the (100) surfaces of HPHT single-crystal diamond
by: L. M. Yang, et al.
Published: (2017)

Obtaining silicon carbide via chemical vapor, plasma-chemical and sublimation methods
by: Zhuravlov, А.Yu., et al.
Published: (2017)

“String” type of barrierless plasma chemical reactor for generation ozone from air
by: Kudin, D.V., et al.
Published: (2021)

Precision control system for a continuous chemical reactor
by: A. A. Stopakevich, et al.
Published: (2019)

On the critical behaviour of random anisotropy magnets: cubic anisotropy
by: Dudka, M., et al.
Published: (2001)

Optimization of conditions for treatment of ZnSe crystal surfaces by chemical etching
by: V. M. Tomashyk, et al.
Published: (2013)

Nanodimensional formations on the CdTe and ZnₓCd₁₋ₓTe surfaces at chemical etching
by: Tomashyk, Z.F., et al.
Published: (2008)

Optimization of conditions for treatment of ZnSe crystal surfaces by chemical etching
by: Tomashyk, V.M., et al.
Published: (2013)

Ab Initio Calculation of Magnetic Interaction Between Edge Dislocation and Oxygen Impurity in Silicon
by: I. V. Pliushchai, et al.
Published: (2014)

Application of dielectric barrier discharge and plasma-chemical reactor for water purification from NH₄OH
by: Taran, V.S., et al.
Published: (2020)

The effect of the composition of the solution and microdispersed metallic phase in the volume of the reactor on the effect of the hydrodynamic limitation of the rate of chemical deposition of silver
by: V. D. Kalugin, et al.
Published: (2012)

The structurally-chemical state and classification phases of the oxide and metal in system iron-silicon-titanium-oxygen. Report 2
by: B. F. Belov, et al.
Published: (2015)

Plasma etching of gallium nitride based heterostructures in production of optoelectronic devices
by: S. V. Dudin
Published: (2006)

Microfluctuations of oxygen impurity concentration as a reason of accelerated oxygen diffusion in silicon
by: Neimash, V.B., et al.
Published: (2000)

Hydrogen gettering in annealed oxygen-implanted silicon
by: A. Misiuk, et al.
Published: (2010)

Effect of weak magnetic field on structural arrangement of extrinsic oxygen atoms and mechanical properties of silicon monocrystals
by: Makara, V.A., et al.
Published: (2006)

ICRF plasmas for fusion reactor applications
by: Lyssoivan, A., et al.
Published: (2007)

Analyzing silicon for the content of oxygen, nitrogen and hydrogen impurities
by: R. V. Kozin, et al.
Published: (2024)

Boron, aluminum, nitrogen, oxygen impurities in silicon carbide
by: Vlaskina, S.I., et al.
Published: (2007)

Ozone decay in chemical reactor with the developed inner surface
by: Manuilenko, О.V., et al.
Published: (2017)

Investigations of short range ordering in Fe-(5-6)% (at.) Si single crystals with diffusive magnetic anisotropy
by: Serikov, V.V., et al.
Published: (2006)

Vortex polarity switching in magnets with surface anisotropy
by: O. V. Pylypovskyi, et al.
Published: (2015)

High-gradient fields in magnets with giant anisotropy
by: Samofalov, V.N., et al.
Published: (2008)

Vortex polarity switching in magnets with surface anisotropy
by: Pylypovskyi, O.V., et al.
Published: (2015)