IR spectroscopic study of thin ZnO films grown using the atomic layer deposition method
Saved in:
| Date: | 2016 |
|---|---|
| Main Authors: | Ye. F. Venher, Yu. Melnychuk, O. V. Melnychuk, T. V. Semikina |
| Format: | Article |
| Language: | English |
| Published: |
2016
|
| Series: | Ukrainian Journal of Physics |
| Online Access: | http://jnas.nbuv.gov.ua/article/UJRN-0000674436 |
| Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
| Journal Title: | Library portal of National Academy of Sciences of Ukraine | LibNAS |
Institution
Library portal of National Academy of Sciences of Ukraine | LibNASSimilar Items
-
IR Spectroscopic Study of Thin ZnO Films Grown Using the Atomic Layer Deposition Method
by: E. F. Venger, et al.
Published: (2016) -
Diode structures and electrical properties of ZnO films grown using the atomic layer deposition method
by: T. V. Semikina
Published: (2016) -
ZnO thin films obtained by atomic layer deposition as a material for photovoltaics
by: T. V. Semikina, et al.
Published: (2016) -
ZnO thin films obtained by atomic layer deposition as a material for photovoltaics
by: T. V. Semikina, et al.
Published: (2016) -
Surface polariton excitation in ZnO films deposited using ALD
by: E. F. Venger, et al.
Published: (2015)