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Influence of the surface roughness and oxide surface layer onto Si optical constants measured by the ellipsometry technique

Influence of the surface roughness and oxide surface layer onto Si optical constants measured by the ellipsometry technique

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Bibliographic Details
Main Authors: T. S. Rozouvan, L. V. Poperenko, I. A. Shaykevich
Format: Article
Language:English
Published: 2015
Series:Semiconductor Physics, Quantum Electronics and Optoelectronics
Online Access:http://jnas.nbuv.gov.ua/article/UJRN-0000353228
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Internet

http://jnas.nbuv.gov.ua/article/UJRN-0000353228

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