Influence of conditions of deposition and annealing on a nanohardness of amorphous Si–C–N films

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Бібліографічні деталі
Дата:2015
Автор: O. K. Porada
Формат: Стаття
Мова:Англійська
Опубліковано: 2015
Назва видання:Nanosystems, nanomaterials, nanotechnologies
Онлайн доступ:http://jnas.nbuv.gov.ua/article/UJRN-0000454323
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Назва журналу:Library portal of National Academy of Sciences of Ukraine | LibNAS

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Library portal of National Academy of Sciences of Ukraine | LibNAS
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spelling open-sciencenbuvgovua-601132024-04-16T12:48:00Z Influence of conditions of deposition and annealing on a nanohardness of amorphous Si–C–N films O. K. Porada 1816-5230 2015 en Nanosystems, nanomaterials, nanotechnologies http://jnas.nbuv.gov.ua/article/UJRN-0000454323 Article
spellingShingle Nanosystems, nanomaterials, nanotechnologies
O. K. Porada
Influence of conditions of deposition and annealing on a nanohardness of amorphous Si–C–N films
title Influence of conditions of deposition and annealing on a nanohardness of amorphous Si–C–N films
title_full Influence of conditions of deposition and annealing on a nanohardness of amorphous Si–C–N films
title_fullStr Influence of conditions of deposition and annealing on a nanohardness of amorphous Si–C–N films
title_full_unstemmed Influence of conditions of deposition and annealing on a nanohardness of amorphous Si–C–N films
title_short Influence of conditions of deposition and annealing on a nanohardness of amorphous Si–C–N films
title_sort influence of conditions of deposition and annealing on a nanohardness of amorphous si–c–n films
url http://jnas.nbuv.gov.ua/article/UJRN-0000454323
work_keys_str_mv AT okporada influenceofconditionsofdepositionandannealingonananohardnessofamorphoussicnfilms