Effect of the nitrogen flow on the properties of Si–C–N amorphous thin films produced by magnetron sputtering
Saved in:
| Date: | 2015 |
|---|---|
| Main Authors: | A. O. Kozak, V. I. Ivashchenko, O. K. Porada, L. A. Ivashchenko, O. K. Synelnychenko, S. M. Dub, O. S. Lytvyn, I. I. Tymofieieva, H. M. Tolmacheva |
| Format: | Article |
| Language: | English |
| Published: |
2015
|
| Series: | Superhard Materials |
| Online Access: | http://jnas.nbuv.gov.ua/article/UJRN-0000694123 |
| Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
| Journal Title: | Library portal of National Academy of Sciences of Ukraine | LibNAS |
Institution
Library portal of National Academy of Sciences of Ukraine | LibNASSimilar Items
Structure and properties of the coatings of the Al–B–Si–C system deposited by magnetron sputtering
by: A. O. Kozak, et al.
Published: (2020)
by: A. O. Kozak, et al.
Published: (2020)
Influence of nitrogen on the microstructure, hardness and tribological properties of Cr–Ni–B–C–N films deposited by DC magnetron sputtering
by: O. O. Onopriienko, et al.
Published: (2020)
by: O. O. Onopriienko, et al.
Published: (2020)
Deposition and characterization of thin Si–B–C–N films by dc reactive magnetron sputtering of composed Si/B4C target
by: A. A. Onoprienko, et al.
Published: (2019)
by: A. A. Onoprienko, et al.
Published: (2019)
The flow density of atoms sputtered from a cathode of cylinder magnetron
by: Panchenko, O.A., et al.
Published: (2005)
by: Panchenko, O.A., et al.
Published: (2005)
Synthesis of thin-film Ta₂O₅ coatings by reactive magnetron sputtering
by: Yakovin, S., et al.
Published: (2016)
by: Yakovin, S., et al.
Published: (2016)
Infrared heaters with thin-film conductive layers were synthesized on the glass by the magnetron sputtering
by: Lytvynenko, V.V., et al.
Published: (2017)
by: Lytvynenko, V.V., et al.
Published: (2017)
Formation of porous zinc nanosystems using direct and reverse flows of DC magnetron sputtering
by: Latyshev, V.M., et al.
Published: (2017)
by: Latyshev, V.M., et al.
Published: (2017)
Structural studies of zinc oxide and aluminum nitride films obtained by CVD and magnetron sputtering methods
by: A. D. Pogrebnjak, et al.
Published: (2012)
by: A. D. Pogrebnjak, et al.
Published: (2012)
Characterization of Ti–B–C–N films deposited by dc magnetron sputtering of bicomponent Ti/B4C target
by: A. A. Onoprienko, et al.
Published: (2015)
by: A. A. Onoprienko, et al.
Published: (2015)
Solid ion accelerator based on magnetron sputtering discharge
by: Azarenkov, N.A., et al.
Published: (2004)
by: Azarenkov, N.A., et al.
Published: (2004)
Structural and optical studies of Cu₆PSe₅I-based thin film deposited by magnetron sputtering
by: Studenyak, I.P., et al.
Published: (2017)
by: Studenyak, I.P., et al.
Published: (2017)
Hard plasmachemical a-SiCN coatings
by: O. K. Porada, et al.
Published: (2016)
by: O. K. Porada, et al.
Published: (2016)
Deposition of the stoichiometric coatings by reactive magnetron sputtering
by: Sagalovych, A., et al.
Published: (2012)
by: Sagalovych, A., et al.
Published: (2012)
Deposition of the stoichiometric coatings by reactive magnetron sputtering
by: A. Sagalovych, et al.
Published: (2012)
by: A. Sagalovych, et al.
Published: (2012)
Electrical and optical parameters of Cu₆PS₅I-based thin films deposited using magnetron sputtering
by: Studenyak, I.P., et al.
Published: (2016)
by: Studenyak, I.P., et al.
Published: (2016)
Structure of Fe-Cu coatings prepared by the magnetron sputtering method
by: Nowakowska-Langier, K., et al.
Published: (2010)
by: Nowakowska-Langier, K., et al.
Published: (2010)
Development of arc suppression technique for reactive magnetron sputtering
by: S. V. Dudin, et al.
Published: (2005)
by: S. V. Dudin, et al.
Published: (2005)
Solid ion source based on hollow-cylindrical magnetron sputtering discharge
by: Azarenkov, N.A., et al.
Published: (2003)
by: Azarenkov, N.A., et al.
Published: (2003)
Characterization of Ti–B–C–N films deposited by dc magnetron sputtering of bicomponent Ti/B₄C target
by: Onoprienko, A.A., et al.
Published: (2015)
by: Onoprienko, A.A., et al.
Published: (2015)
Formation of antibacterial coatings on chitosan matrices by magnetron sputtering
by: O. V. Kalinkevich, et al.
Published: (2017)
by: O. V. Kalinkevich, et al.
Published: (2017)
The Vacuub Device for Receiving Coatings on the Inner Surface of the Pipes by Magnetron Sputtering
by: V. M. Kolomiiets, et al.
Published: (2020)
by: V. M. Kolomiiets, et al.
Published: (2020)
Features of high-current pulsed regimes in regimes in magnetron sputtering systems
by: Bizyukov, A.A., et al.
Published: (2005)
by: Bizyukov, A.A., et al.
Published: (2005)
Structural and optical studies of Cu6PSe5I-based thin film deposited by magnetron sputtering
by: I. P. Studenyak, et al.
Published: (2017)
by: I. P. Studenyak, et al.
Published: (2017)
Properties of coatings of the Al–Cr–Fe–Co–Ni–Cu–V high entropy alloy produced by the magnetron sputtering
by: L. R. Shaginjan, et al.
Published: (2016)
by: L. R. Shaginjan, et al.
Published: (2016)
Structure and Photocatalytic Properties of Titania Nanofilms Deposited by Reactive Magnetron Sputtering
by: A. A. Goncharov, et al.
Published: (2014)
by: A. A. Goncharov, et al.
Published: (2014)
Comparison of optical properties of TiO₂ thin films prepared by reactive magnetron sputtering and electron-beam evaporation techniques
by: Brus, V.V., et al.
Published: (2011)
by: Brus, V.V., et al.
Published: (2011)
Fabrication of nanosize LiPON films by means of high-frequency magnetron sputtering
by: O. I. Vjunov, et al.
Published: (2014)
by: O. I. Vjunov, et al.
Published: (2014)
Electrical and optical parameters of Cu6PS5I-based thin films deposited using magnetron sputtering
by: I. P. Studenyak, et al.
Published: (2016)
by: I. P. Studenyak, et al.
Published: (2016)
Control of ionization processes in magnetron sputtering system by changing magnetic field configuration
by: Chunadra, А.G., et al.
Published: (2021)
by: Chunadra, А.G., et al.
Published: (2021)
Control of planar magnetron sputtering system operating modes by additional anode magnetic field
by: Bizyukov, A.A., et al.
Published: (2010)
by: Bizyukov, A.A., et al.
Published: (2010)
Comparison of optical properties of TiO2 thin films prepared by reactive magnetron sputtering and electron-beam evaporation techniques
by: V. V. Brus, et al.
Published: (2011)
by: V. V. Brus, et al.
Published: (2011)
Magnetron sputtered coatings of AlN-TiCrB₂ system
by: Panasyuk, A.D., et al.
Published: (2009)
by: Panasyuk, A.D., et al.
Published: (2009)
Stydy on resistivity and micostructure of magnetron sputtered α-C:Si films
by: Onoprienko, A.A., et al.
Published: (2006)
by: Onoprienko, A.A., et al.
Published: (2006)
Digital processing of optical emission spectra of magnetron sputtering plasma system
by: Afanasіeva, I.A., et al.
Published: (2019)
by: Afanasіeva, I.A., et al.
Published: (2019)
Phase composition, structure and stress state of magnetron sputtered W-Ti condensates
by: Sobol`, O.V.
Published: (2006)
by: Sobol`, O.V.
Published: (2006)
Evolution of the structure of Mo films obtained by magnetron sputtering on a-Si
by: V. A. Sevrjukova, et al.
Published: (2011)
by: V. A. Sevrjukova, et al.
Published: (2011)
Synthesis of TiO₂ different phase by DC magnetron sputtering
by: Dobrovolskiy, A., et al.
Published: (2014)
by: Dobrovolskiy, A., et al.
Published: (2014)
Plasma assisted deposition of TaB₂ coatings by magnetron sputtering system
by: Yakovin, S., et al.
Published: (2017)
by: Yakovin, S., et al.
Published: (2017)
Effect of nitrogen partial pressure on reactive magnetron sputtering from Ti13Cu87 metalloid target: simulation of chemical composition
by: A. Rahmati, et al.
Published: (2012)
by: A. Rahmati, et al.
Published: (2012)
Effect of nitrogen partial pressure on reactive magnetron sputtering from Ti13Cu87 metalloid target: simulation of chemical composition
by: A. Rahmati, et al.
Published: (2012)
by: A. Rahmati, et al.
Published: (2012)
Similar Items
-
Structure and properties of the coatings of the Al–B–Si–C system deposited by magnetron sputtering
by: A. O. Kozak, et al.
Published: (2020) -
Influence of nitrogen on the microstructure, hardness and tribological properties of Cr–Ni–B–C–N films deposited by DC magnetron sputtering
by: O. O. Onopriienko, et al.
Published: (2020) -
Deposition and characterization of thin Si–B–C–N films by dc reactive magnetron sputtering of composed Si/B4C target
by: A. A. Onoprienko, et al.
Published: (2019) -
The flow density of atoms sputtered from a cathode of cylinder magnetron
by: Panchenko, O.A., et al.
Published: (2005) -
Synthesis of thin-film Ta₂O₅ coatings by reactive magnetron sputtering
by: Yakovin, S., et al.
Published: (2016)