Najafov, B. A., & Dadashova, V. V. (2014). Optoelectronic properties of thin hydrogenated a-Si1–xGex: H (x = 0ч1) films produced by plasma chemical deposition technique.
Chicago-Zitierstil (17. Ausg.)Najafov, B. A., und V. V. Dadashova. Optoelectronic Properties of Thin Hydrogenated A-Si1–xGex: H (x = 0ч1) Films Produced by Plasma Chemical Deposition Technique. 2014.
MLA-Zitierstil (8. Ausg.)Najafov, B. A., und V. V. Dadashova. Optoelectronic Properties of Thin Hydrogenated A-Si1–xGex: H (x = 0ч1) Films Produced by Plasma Chemical Deposition Technique. 2014.
Achtung: Diese Zitate sind unter Umständen nicht zu 100% korrekt.