Low-temperature ion-plasma deposition technology of nanostructured films of aluminum and boron nitrides

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Бібліографічні деталі
Дата:2021
Автори: M. S. Zaiats, V. H. Boiko, B. M. Romaniuk, P. M. Lytvyn
Формат: Стаття
Мова:English
Опубліковано: 2021
Назва видання:Optoelectronics and Semiconductor Technique
Онлайн доступ:http://jnas.nbuv.gov.ua/article/UJRN-0001342045
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Назва журналу:Library portal of National Academy of Sciences of Ukraine | LibNAS

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Library portal of National Academy of Sciences of Ukraine | LibNAS
id open-sciencenbuvgovua-9372
record_format dspace
spelling open-sciencenbuvgovua-93722024-02-25T16:11:29Z Low-temperature ion-plasma deposition technology of nanostructured films of aluminum and boron nitrides M. S. Zaiats V. H. Boiko B. M. Romaniuk P. M. Lytvyn 2707-6806 2021 en Optoelectronics and Semiconductor Technique http://jnas.nbuv.gov.ua/article/UJRN-0001342045 Article
institution Library portal of National Academy of Sciences of Ukraine | LibNAS
collection Open-Science
language English
series Optoelectronics and Semiconductor Technique
spellingShingle Optoelectronics and Semiconductor Technique
M. S. Zaiats
V. H. Boiko
B. M. Romaniuk
P. M. Lytvyn
Low-temperature ion-plasma deposition technology of nanostructured films of aluminum and boron nitrides
format Article
author M. S. Zaiats
V. H. Boiko
B. M. Romaniuk
P. M. Lytvyn
author_facet M. S. Zaiats
V. H. Boiko
B. M. Romaniuk
P. M. Lytvyn
author_sort M. S. Zaiats
title Low-temperature ion-plasma deposition technology of nanostructured films of aluminum and boron nitrides
title_short Low-temperature ion-plasma deposition technology of nanostructured films of aluminum and boron nitrides
title_full Low-temperature ion-plasma deposition technology of nanostructured films of aluminum and boron nitrides
title_fullStr Low-temperature ion-plasma deposition technology of nanostructured films of aluminum and boron nitrides
title_full_unstemmed Low-temperature ion-plasma deposition technology of nanostructured films of aluminum and boron nitrides
title_sort low-temperature ion-plasma deposition technology of nanostructured films of aluminum and boron nitrides
publishDate 2021
url http://jnas.nbuv.gov.ua/article/UJRN-0001342045
work_keys_str_mv AT mszaiats lowtemperatureionplasmadepositiontechnologyofnanostructuredfilmsofaluminumandboronnitrides
AT vhboiko lowtemperatureionplasmadepositiontechnologyofnanostructuredfilmsofaluminumandboronnitrides
AT bmromaniuk lowtemperatureionplasmadepositiontechnologyofnanostructuredfilmsofaluminumandboronnitrides
AT pmlytvyn lowtemperatureionplasmadepositiontechnologyofnanostructuredfilmsofaluminumandboronnitrides
first_indexed 2024-03-30T06:53:49Z
last_indexed 2024-03-30T06:53:49Z
_version_ 1796878245393596416