Deposition of the stoichiometric coatings by reactive magnetron sputtering

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Datum:2012
Hauptverfasser: A. Sagalovych, S. Dudnik, V. Sagalovych
Format: Artikel
Sprache:Englisch
Veröffentlicht: 2012
Schriftenreihe:Physical surface engineering
Online Zugang:http://jnas.nbuv.gov.ua/article/UJRN-0000906899
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Назва журналу:Library portal of National Academy of Sciences of Ukraine | LibNAS

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Library portal of National Academy of Sciences of Ukraine | LibNAS
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author A. Sagalovych
S. Dudnik
V. Sagalovych
author_facet A. Sagalovych
S. Dudnik
V. Sagalovych
author_sort A. Sagalovych
collection Open-Science
first_indexed 2025-07-22T13:33:11Z
format Article
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institution Library portal of National Academy of Sciences of Ukraine | LibNAS
language English
last_indexed 2025-07-22T13:33:11Z
publishDate 2012
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series Physical surface engineering
spelling open-sciencenbuvgovua-941202024-04-17T17:04:15Z Deposition of the stoichiometric coatings by reactive magnetron sputtering A. Sagalovych S. Dudnik V. Sagalovych 1999-8074 2012 en Physical surface engineering http://jnas.nbuv.gov.ua/article/UJRN-0000906899 Article
spellingShingle Physical surface engineering
A. Sagalovych
S. Dudnik
V. Sagalovych
Deposition of the stoichiometric coatings by reactive magnetron sputtering
title Deposition of the stoichiometric coatings by reactive magnetron sputtering
title_full Deposition of the stoichiometric coatings by reactive magnetron sputtering
title_fullStr Deposition of the stoichiometric coatings by reactive magnetron sputtering
title_full_unstemmed Deposition of the stoichiometric coatings by reactive magnetron sputtering
title_short Deposition of the stoichiometric coatings by reactive magnetron sputtering
title_sort deposition of the stoichiometric coatings by reactive magnetron sputtering
url http://jnas.nbuv.gov.ua/article/UJRN-0000906899
work_keys_str_mv AT asagalovych depositionofthestoichiometriccoatingsbyreactivemagnetronsputtering
AT sdudnik depositionofthestoichiometriccoatingsbyreactivemagnetronsputtering
AT vsagalovych depositionofthestoichiometriccoatingsbyreactivemagnetronsputtering