Structural properties of nanocomposite SiO2(Si) films obtained by ion-plasma sputtering and thermal annealing

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Bibliographic Details
Date:2011
Main Authors: O. L. Bratus, A. A. Evtukh, O. S. Lytvyn, M. V. Voitovych, V. O. Yukhymchuk
Format: Article
Language:English
Published: 2011
Series:Semiconductor Physics, Quantum Electronics and Optoelectronics
Online Access:http://jnas.nbuv.gov.ua/article/UJRN-0000349503
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Library portal of National Academy of Sciences of Ukraine | LibNAS
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spelling open-sciencenbuvgovua-961472024-04-17T17:25:09Z Structural properties of nanocomposite SiO2(Si) films obtained by ion-plasma sputtering and thermal annealing O. L. Bratus A. A. Evtukh O. S. Lytvyn M. V. Voitovych V. O. Yukhymchuk 1560-8034 2011 en Semiconductor Physics, Quantum Electronics and Optoelectronics http://jnas.nbuv.gov.ua/article/UJRN-0000349503 Article
institution Library portal of National Academy of Sciences of Ukraine | LibNAS
collection Open-Science
language English
series Semiconductor Physics, Quantum Electronics and Optoelectronics
spellingShingle Semiconductor Physics, Quantum Electronics and Optoelectronics
O. L. Bratus
A. A. Evtukh
O. S. Lytvyn
M. V. Voitovych
V. O. Yukhymchuk
Structural properties of nanocomposite SiO2(Si) films obtained by ion-plasma sputtering and thermal annealing
format Article
author O. L. Bratus
A. A. Evtukh
O. S. Lytvyn
M. V. Voitovych
V. O. Yukhymchuk
author_facet O. L. Bratus
A. A. Evtukh
O. S. Lytvyn
M. V. Voitovych
V. O. Yukhymchuk
author_sort O. L. Bratus
title Structural properties of nanocomposite SiO2(Si) films obtained by ion-plasma sputtering and thermal annealing
title_short Structural properties of nanocomposite SiO2(Si) films obtained by ion-plasma sputtering and thermal annealing
title_full Structural properties of nanocomposite SiO2(Si) films obtained by ion-plasma sputtering and thermal annealing
title_fullStr Structural properties of nanocomposite SiO2(Si) films obtained by ion-plasma sputtering and thermal annealing
title_full_unstemmed Structural properties of nanocomposite SiO2(Si) films obtained by ion-plasma sputtering and thermal annealing
title_sort structural properties of nanocomposite sio2(si) films obtained by ion-plasma sputtering and thermal annealing
publishDate 2011
url http://jnas.nbuv.gov.ua/article/UJRN-0000349503
work_keys_str_mv AT olbratus structuralpropertiesofnanocompositesio2sifilmsobtainedbyionplasmasputteringandthermalannealing
AT aaevtukh structuralpropertiesofnanocompositesio2sifilmsobtainedbyionplasmasputteringandthermalannealing
AT oslytvyn structuralpropertiesofnanocompositesio2sifilmsobtainedbyionplasmasputteringandthermalannealing
AT mvvoitovych structuralpropertiesofnanocompositesio2sifilmsobtainedbyionplasmasputteringandthermalannealing
AT voyukhymchuk structuralpropertiesofnanocompositesio2sifilmsobtainedbyionplasmasputteringandthermalannealing
first_indexed 2025-07-22T14:07:37Z
last_indexed 2025-07-22T14:07:37Z
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