Дослідження параметрів глибокого рівня в напівпровідниках
We propose to use methods involving a deformation for the determination of deep-level parameters in semiconductors. The methods are based on the measurement of strain parameters of compensated and overcompensated semiconductors. The dynamic changes of the current flow in compensated and overcompensa...
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| Datum: | 2018 |
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| 1. Verfasser: | |
| Format: | Artikel |
| Sprache: | English |
| Veröffentlicht: |
Publishing house "Academperiodika"
2018
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| Schlagworte: | |
| Online Zugang: | https://ujp.bitp.kiev.ua/index.php/ujp/article/view/2018241 |
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| Назва журналу: | Ukrainian Journal of Physics |
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Ukrainian Journal of Physics| Zusammenfassung: | We propose to use methods involving a deformation for the determination of deep-level parameters in semiconductors. The methods are based on the measurement of strain parameters of compensated and overcompensated semiconductors. The dynamic changes of the current flow in compensated and overcompensated samples of the p-type Si : Ni and n-type Si : Mn under a uniform pulse hydrostatic compression (UHC) are investigated. It is observed that, in the p-type Si : Ni samples the, ionization energy level of Ni increases at UHC. On the contrary, it decreases in samples of the n-type Si : Mn. The ionization energy and the baric coefficient of shift of Ni and Mn levels are bounded. |
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