Спектроскопiчнi дослiдження плазми високочастотного розряду при плазмохiмiчному травленнi епiтаксiальних структур нiтриду галiю
The results of experimental researched dealing with the bias voltage influence on the evolution of spectra emitted by plasma at the etching of gallium nitride in a plasma-chemical reactor with the controlled magnetic field are reported. At high bias voltage values above –250 V, there appear lines in...
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| Date: | 2018 |
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| Main Authors: | , |
| Format: | Article |
| Language: | English |
| Published: |
Publishing house "Academperiodika"
2018
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| Online Access: | https://ujp.bitp.kiev.ua/index.php/ujp/article/view/2018698 |
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| Journal Title: | Ukrainian Journal of Physics |