Спектроскопiчнi дослiдження плазми високочастотного розряду при плазмохiмiчному травленнi епiтаксiальних структур нiтриду галiю

• Date: 2018
• Main Authors: Hladkovskiy, V. V., Fedorovich, O. A.
• Format: Article
• Language: English
• Published: Publishing house "Academperiodika" 2018
• Online Access: https://ujp.bitp.kiev.ua/index.php/ujp/article/view/2018698
• Journal Title: Ukrainian Journal of Physics

The results of experimental researched dealing with the bias voltage influence on the evolution of spectra emitted by plasma at the etching of gallium nitride in a plasma-chemical reactor with the controlled magnetic field are reported. At high bias voltage values above –250 V, there appear lines in...