Формування стiйких поверхневих структур при iонному розпорошеннi в рамках анiзотропної моделi Курамото–Сiвашинського
The processes of change of a surface morphology and formation of a stationary pattern at the ion sputtering are considered. A linear stability analysis was carried out, and the range of parameters, at which the patterning is possible, is determined. Assuming the existence of a stabilization paramete...
Збережено в:
| Дата: | 2019 |
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| Автор: | |
| Формат: | Стаття |
| Мова: | English Ukrainian |
| Опубліковано: |
Publishing house "Academperiodika"
2019
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| Теми: | |
| Онлайн доступ: | https://ujp.bitp.kiev.ua/index.php/ujp/article/view/2019061 |
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| Назва журналу: | Ukrainian Journal of Physics |
Репозитарії
Ukrainian Journal of Physics| Резюме: | The processes of change of a surface morphology and formation of a stationary pattern at the ion sputtering are considered. A linear stability analysis was carried out, and the range of parameters, at which the patterning is possible, is determined. Assuming the existence of a stabilization parameter that involves the redistribution of knocked-out atoms, all evolution scenarios for the surface are obtained numerically. The dynamics of defects is numerically analyzed for every structure type, and the corresponding time dependences are plotted. |
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