Вплив тиску аргону в камерi осадження на властивостi легованих алюмiнiєм плiвок ZnO, вирощених методом пошарового осадження при магнетронному розпиленнi
ZnO:Al films are deposited layer-by-layer onto silicon and glass substrates, by using the radio-frequency magnetron sputtering method at various argon pressures from 0.5 to 2 Pa in a deposition chamber. The influence of this pressure on the structure and the optical and electrical properties of ZnO:...
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| Date: | 2019 |
|---|---|
| Main Authors: | , , , , , , , , , , , |
| Format: | Article |
| Language: | English Ukrainian |
| Published: |
Publishing house "Academperiodika"
2019
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| Subjects: | |
| Online Access: | https://ujp.bitp.kiev.ua/index.php/ujp/article/view/2019095 |
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| Journal Title: | Ukrainian Journal of Physics |