Комбiнацiйне розсiювання свiтла в процесi iндукованої оловом кристалiзацiї аморфного кремнiю

Metal-induced crystallization in Si–Sn–Si thin film structures has been studied, by using the Raman scattering at various light powers. The Raman spectra are used to monitor the temperature, size, and concentration of Si crystals formed in the amorphous Si matrix. A significant acceleration of the m...

Full description

Saved in:
Bibliographic Details
Date:2019
Main Authors: Neimash, V., Dovbeshko, G., Shepelyavyi, P., Danko, V., Melnyk, V., Isaiev, M., Kuzmich, A.
Format: Article
Language:English
Ukrainian
Published: Publishing house "Academperiodika" 2019
Subjects:
Online Access:https://ujp.bitp.kiev.ua/index.php/ujp/article/view/2019115
Tags: Add Tag
No Tags, Be the first to tag this record!
Journal Title:Ukrainian Journal of Physics

Institution

Ukrainian Journal of Physics
Description
Summary:Metal-induced crystallization in Si–Sn–Si thin film structures has been studied, by using the Raman scattering at various light powers. The Raman spectra are used to monitor the temperature, size, and concentration of Si crystals formed in the amorphous Si matrix. A significant acceleration of the metal-induced crystallization in Si–Sn–Si structures at their laser-assisted annealing in comparison with their annealing in dark is revealed. A basic possibility of the “on line” monitoring of the size and the concentration of Si nanocrystals in the course of their formation is demonstrated.