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Механiзми еволюцiї поверхнi при ростi нелегованих нанокремнiєвих плiвок

Механiзми еволюцiї поверхнi при ростi нелегованих нанокремнiєвих плiвок

The thickness dependence of the surface roughness and the grain size of nanosilicon films, produced by low-pressure chemical vapour deposition, has been found, by using atomic force microscopy. A correlation between the surface roughness, grain size, and transformation of a film structure from the e...

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Bibliographic Details
Main Authors: Nakhodkin, N. G., Rodionova, T. V., Sutyagina, A. S.
Format: Article
Language:English
Ukrainian
Published: Publishing house "Academperiodika" 2019
Subjects:
нанокремнiєвi плiвки
поверхневi неоднорiдностi
рiст зерен
механiзм росту зерен
атомна силова мiкроскопiя
nanosilicon films
surface roughness
grain growth
mechanism of grain growth
atomic force microscopy
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Online Access:https://ujp.bitp.kiev.ua/index.php/ujp/article/view/2019277
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Summary:The thickness dependence of the surface roughness and the grain size of nanosilicon films, produced by low-pressure chemical vapour deposition, has been found, by using atomic force microscopy. A correlation between the surface roughness, grain size, and transformation of a film structure from the equiaxial structure into a fibrous one is established. Possible mechanisms of surface evolution are analyzed.

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