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Вплив парціального тиску азоту на реактивне магнетронне розпилення Ti13Cu87 мішені: моделювання хімічного складу

A sintered Ti13Cu87 composite target was reactively sputtered in Ar–N2 gas mixtures, and sputtered species were deposited on Si (111) substrates. We study the pressure-dependent target mode variation of the Ti13Cu87–N2 system, by measuring the N2 partial pressure, deposition rate, target voltage, an...

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Bibliographic Details
Date:2012
Main Authors: Rahmati, A., Khanzadeh, M.
Format: Article
Language:English
Published: Publishing house "Academperiodika" 2012
Subjects:
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Online Access:https://ujp.bitp.kiev.ua/index.php/ujp/article/view/2021247
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Journal Title:Ukrainian Journal of Physics

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Ukrainian Journal of Physics

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