Spatial distributions of plasma parameters in ICP reactor by Dudin, S.V., Dahov, A.N., Farenik, V.I.

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Development of arc suppression technique for reactive magnetron sputtering by Dudin, S.V., Farenik, V.I., Dahov, A.N., Walkowicz, J.

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Режим работы двухкаскадного термоэлектрического охлаждающего устройства, обе­с­пе­чи­ва­ю­щий минимальную интенсивность отказов... by Dudin, S. V., Lisovskiy, V. А., Dahov, A. N., Pletniov, V. M.

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Experimental research of ICP reactor for plasma-chemical etching by Dudin, S.V., Zykov, A.V., Dahov, A.N., Farenik, V.I.

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2D fluid model for interactive development of ICP technological tools by Gapon, A.V., Dahov, A.N., Dudin, S.V., Zykov, A.V., Azarenkov, N.A.

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