Activation of porous Si blue emission due to preanodization ion implantation von Rozhin, A.G., Klyui, N.I., Litovchenko, V.G., Melnik, V.P., Romanyuk, B.N., Piryatinskii, Yu.P.

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Be-ion-implanted p-n InSb diode for infrared applications. Modeling, fabrication, and characterization von Korotyeyev, V.V., Kochelap, V.O., Sapon, S.V., Romaniuk, B.M., Melnik, V.P., Dubikovskyi, O.V., Sabov, T.M.

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The effect of ion implantation on structural damage in compositionally graded AlGaN layers von Liubchenko, O.I., Kladko, V.P., Stanchu, H.V., Sabov, T.M., Melnik, V.P., Kryvyi, S.B., Belyaev, A.Ye.

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Strain relaxation in thin Si₁-ₓ-yGeₓCy layers on Si substrates von Valakh, M.Ya., Gamov, D.V., Dzhagan, V.M., Lytvyn, O.S., Melnik, V.P., Romanjuk, B.M., Popov, V.G., Yukhymchuk, V.O.

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Electrical properties of semiconductor structures with Si nanoclusters in SiO₂ grown by high temperature annealing technology of SiOx layer, X<2 von Bunak, S.V., Buyanin, A.A., Ilchenko, V.V., Marin, V.V., Melnik, V.P., Khacevich, I.M., Tretyak, O.V., Shkavro, A.G.

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Oxygen ion-beam modification of vanadium oxide films for reaching a high value of the resistance temperature coefficient von Sabov, T.M., Oberemok, O.S., Dubikovskyi, O.V., Melnik, V.P., Kladko, V.P., Romanyuk, B.M., Popov, V.G., Gudymenko, O.Yo., Safriuk, N.V.

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