Search Results - Reshetnyak, E.N.
- Showing 1 - 19 results of 19
-
1
-
2
-
3
-
4
-
5
-
6
-
7
-
8
-
9
Structure and stress state of ion-plasma hafnium condensates by Vus, A.S., Malykhin, S.V., Pugachev, A.T., Reshetnyak, E.N., Azhazha, R.V., Kovtun, K.V.
Published in Functional Materials (2007)Get full text
Article -
10
-
11
-
12
Structure and properties of the (Cr, Al)N coatings deposited by PIII&D method by Vasyliev, V.V., Luchaninov, A.A., Reshetnyak, E.N., Strel’nitskij, V.E., Lorentz, B., Reichert, S., Zavaleyev, V., Walkowicz, J., Sawczak, M.
Published in Вопросы атомной науки и техники (2016)Get full text
Article -
13
Protective vacuum-arc coatings on zirconium alloy fuel cladding to prevent catastrophic accidents at nuclear reactors by Kuprin, A.S., Zuyok, V.A., Belous, V.A., Ovcharenko, V.D., Reshetnyak, E.N., Vasilenko, R.L., Tolmachova, G.N., Kushtym, Ya.O.
Published in Problems of Atomic Science and Technology (2023)Get full text
Article -
14
Effect of nitrogen pressure on the structural and mechanical properties of V-Mo-N coatings deposited by cathodic arc evaporation by Kuprin, A.S., Reshetnyak, E.N., Gilewicz, A., Warcholinski, B., Vasilenko, R.L., Rostova, H.Yu., Klimenko, I.O., Tolmachova, G.N., Ilchenko, A.V.
Published in Вопросы атомной науки и техники (2022)Get full text
Article -
15
Structure and properties of W, Ta and W-Ta coatings deposited with the use of a gas-plasma source by Lunyov, V.M., Kuprin, A.S., Ovcharenko, V.D., Belous, V.A., Morozov, A.N., Ilchenko, A.V., Tolmachova, G.N., Reshetnyak, E.N., Vasilenko, R.L.
Published in Вопросы атомной науки и техники (2016)Get full text
Article -
16
-
17
-
18
Deposition of TiN-based coatings using vacuum arc plasma in increased negative substrate bias voltage by Kuprin, A.S., Leonov, S.A., Ovcharenko, V.D., Reshetnyak, E.N., Belous, V.A., Vasilenko, R.L., Tolmachova, G.N., Kovalenko, V.I., Klimenko, I.O.
Published in Вопросы атомной науки и техники (2019)Get full text
Article -
19
Durability of the multicomponent nitride coatings based on TiN and (Ti,Al)N deposited by PIII&D method by Vasyliev, V.V., Goltvyanytsya, V.S., Goltvyanytsya, S.K., Luchaninov, A.A., Marinin, V.G., Reshetnyak, E.N., Strel'nitskij, V.E., Tolmachоva, G.N.
Published in Вопросы атомной науки и техники (2015)Get full text
Article
Search Tools:
Related Subjects
Физика и технология конструкционных материалов
Physics of radiation and ion-plasma technologies
Физика радиационных и ионно-плазменных технологий
Characterization and properties
Low temperature plasma and plasma technologies
Physics of radiotechnology and ion-plasma technologies
Низкотемпературная плазма и плазменные технологии