Structure and stress state of TiN and Ti₀.₅₋xAl₀.₅YxN coatings prepared by the PIII&D technique from filtered vacuum-arc plasma by Reshetnyak, E.N.

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Optimization of diamond-like carbon coatings for mechanical and tribological applications. Review by Reshetnyak, E.N., Luchaninov, A.A., Strel’nitskij, V.E.

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Effect of time parameters of pulsed bias potential on intrinsic stress in TiN coating deposited from inclined ion beam by Kalinichenko, A.I., Perepelkin, S.S., Reshetnyak, E.N., Strel’nitskij, V.E.

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Structure of polycrystalline diamond coatings deposited by СVD method in the plasma of glow discharge with the use of pulse power supply by Koshevoy, K.I., Volkov, Yu.Ya., Strel’nitskij, V.E., Reshetnyak, E.N.

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Composition adjustment of vacuum-arc Ti-Al-N films, deposited with use of two-channel filter by Aksyonov, D.S., Aksenov, I.I., Luchaninov, A.A., Reshetnyak, E.N., Strel’nitskij, V.E.

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Plasma streams mixing in two-channel T-shaped magnetic filter by Aksyonov, D.S., Aksenov, I.I., Luchaninov, A.A., Reshetnyak, E.N., Strel’nitskij, V.E.

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Synthesis of Ti-Si and Ti-Si-N coatings by condensation of filtered vacuum-arc plasma by Aksyonov, D.S., Aksenov, I.I., Luchaninov, A.A., Reshetnyak, E.N., Strel’nitskij, V.E.

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Structure and stress state of ion-plasma hafnium condensates by Vus, A.S., Malykhin, S.V., Pugachev, A.T., Reshetnyak, E.N., Azhazha, R.V., Kovtun, K.V.

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Properties of DLC coatings deposited by DC and DC with superimposed pulsed vacuum arc by Zavaleyev, V., Walkowicz, J., Aksyonov, D.S., Luchaninov, A.A., Reshetnyak, E.N., Strel’nitskij, V.E.

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Surface morphology and structure of nanocrystalline diamond films deposited in CH₄/H₂/Ar glow discharge plasma by Vyrovets, I.I., Gritsyna, V.I., Dudnik, S.F., Opalev, O.A., Reshetnyak, E.N., Strel'nitskiy, V.E.

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Structure and properties of the (Cr, Al)N coatings deposited by PIII&D method by Vasyliev, V.V., Luchaninov, A.A., Reshetnyak, E.N., Strel’nitskij, V.E., Lorentz, B., Reichert, S., Zavaleyev, V., Walkowicz, J., Sawczak, M.

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Radiation resistance of Ti—20Zr alloy in microcrystalline and nanocrystalline state by Belous, V.A., Borodin, O.V., Bryk, V.V., Vasilenko, R.L., Voyevodin, V.N., Kuprin, A.S., Ovcharenko, V.D., Reshetnyak, E.N., Tolmachova, G.N.

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Effect of deuterium implantation dose on properties of CrN coatings by Kuprin, A.S., Belous, V.A., Morozov, O.M., Ovcharenko, V.D., Dub, S.N., Tolmachova, G.N., Reshetnyak, E.N., Zhurba, V.I., Progolaieva, V.O.

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Deposition of TiN-based coatings using vacuum arc plasma in increased negative substrate bias voltage by Kuprin, A.S., Leonov, S.A., Ovcharenko, V.D., Reshetnyak, E.N., Belous, V.A., Vasilenko, R.L., Tolmachova, G.N., Kovalenko, V.I., Klimenko, I.O.

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Durability of the multicomponent nitride coatings based on TiN and (Ti,Al)N deposited by PIII&D method by Vasyliev, V.V., Goltvyanytsya, V.S., Goltvyanytsya, S.K., Luchaninov, A.A., Marinin, V.G., Reshetnyak, E.N., Strel'nitskij, V.E., Tolmachоva, G.N.

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