Influence of deposition rate and substrate temperature on structure and optical features of NiO thin film von Oberemok, O.S., Sabov, T.M., Lisovskyy, I.P., Khacevych, I.M., Gudymenko, O.Yo., Nikirin, V.A., Voitovych, M.V.

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Be-ion-implanted p-n InSb diode for infrared applications. Modeling, fabrication, and characterization von Korotyeyev, V.V., Kochelap, V.O., Sapon, S.V., Romaniuk, B.M., Melnik, V.P., Dubikovskyi, O.V., Sabov, T.M.

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The effect of ion implantation on structural damage in compositionally graded AlGaN layers von Liubchenko, O.I., Kladko, V.P., Stanchu, H.V., Sabov, T.M., Melnik, V.P., Kryvyi, S.B., Belyaev, A.Ye.

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Oxygen ion-beam modification of vanadium oxide films for reaching a high value of the resistance temperature coefficient von Sabov, T.M., Oberemok, O.S., Dubikovskyi, O.V., Melnik, V.P., Kladko, V.P., Romanyuk, B.M., Popov, V.G., Gudymenko, O.Yo., Safriuk, N.V.

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