Registration Materials for Laser Thermolithography

• Дата: 2012
• Автори: Kryuchyn, A. A., Rubish, V. M., Kostiukevych, S. O., Minko, V. I., Shepelyavy, P. E., Lysyuk, V. O., Kostyukevych, K. V., Surmach, M. A.
• Формат: Стаття
• Мова: Ukrainian
• Опубліковано: Інститут проблем реєстрації інформації НАН України 2012
• Теми: thermolithography; inorganic photoresists; nonlinear exposure characteristics
• Онлайн доступ: http://drsp.ipri.kiev.ua/article/view/105215
• Назва журналу: Data Recording, Storage & Processing

The results of analysis on the photosensitive properties of materials with nonlinear exposition characteristic have been performed. It is shown that some photo(thermo)sensitive materials allow to register the image of elements having sizes less than the diameter of exposing beam. The results of lase...